Overview
Electrical Engineering : Essential processes for silicon semiconductor device fabrication: etching, diffusion, photolithography. Fabrication of large area PN junctions, selective area PN junctions and MOSFETs. Design and fabrication of simple MOS circuits. Electrical characterization of devices and circuits.
Terms: Winter 2010
Instructors: Shih, Ishiang (Winter)
- (1-3-2)
- Prerequisites: CCOM 206 or EDEC 206, ECSE 334
- Corequisite: ECSE 432 or ECSE 533
- Limited Enrolment - 12
- Lab hours assigned by instructor.